Resources

1. Introducing Superior Performing Platinum Sputtering Targets

   The sputtering target microstructure plays a direct role in the quality of the subsequent deposited films. Specific thermomechanical processes, such as the use of hot rolling, can be used to produce a grain structure resulting in superior burn in and thin film uniformity.

2. Developments in Tarnish Resistant Silver Alloys

   In the past, expensive silver based alloys have been used to improve tarnish resistance. Data demonstrates that Materion Microelectronics & Services’ Opti-SilTM 592 is a good candidate material to replace more expensive or less corrosion resistant materials in some applications due to the material’s optical properties, sheet resistance, adhesion and sputter rate.

3. FINE GRAIN MICROSTRUCTURAL DEVELOPMENT FOR THIN FILM DEPOSITION APPLICATIONS

   The development of a fine grain microstructure in sputtering targets for thin film applications is a critical factor in the efficiency and robustness of the deposition process. Therefore, finding a practical method for producing superior fine grain targets is necessary.

4. Molybdenum Sputtering Target

   Learn more about the scope, chemical and physical characteristics, formats and dimensional tolerances of molybdenum as a sputtering target.

5. WILLIAMS INTRODUCES SUPERIOR PERFORMING PLATINUM SPUTTERING TARGETS

   The quality of the target microstructure and plays a direct role in the quality of the subsequent deposited films. Thermomechanical methods, like hot rolling, to produce a grain structure are also explored.