Home Products Thin Film Deposition Materials Sputtering Targets VCT™ VCT™ Vibration Casting Technology can decrease grain size by as much as 90%! Materion has developed a method to refine the grain structure of brittle metals without the risk of cracking or breaking. Sputtering target grain structures are typically refined by a combination of metal working and heat treating techniques, but many non-ductile alloys cannot withstand these metal working processes. To resolve the challenge of refining grain structure of brittle metals without mechanically working them, Materion applies VCT™ to the metal as it solidifies. This decreases grain size and enables users to: Stabilize sputtering process parameters Improve film uniformity Raise process yields Increase chamber utilization rates CONTACT MATERION!Our sputtering experts can determine the best vibration casting methods for your product and process. GRAIN STRUCTURE & PERFORMANCE Materion addresses other technical issues when dealing with certain metals. Brittle alloys, such as AuSn or AuGe, often exhibit large and varying grain sizes, creating instability in the thin film deposition process Vibrational frequencies and amplitudes must be carefully selected based on material type, target configuration, and desired grain structure Challenges of sputtering in PVD processes...Read technical paper for more information In addition to the VCT™ Materion offers a full line of sputtering consumables and services, including backing plates, target bonding, precision parts cleaning, recycling & refining and precious metals management.