Sputtering Targets Product Data

Materion’s comprehensive line of PVD products and services can resolve your concerns for uniformity, reproducibility, purity, homogeneity, and other challenges. Learn more.

Materion offers a broad range of support materials and services to the semiconductor industry including sputtering targets, evaporation materials, microelectronics packaging and more.

Materion is producing new alloys for Phase-Change Random Access Memory (PC-RAM) applications. We meet the need of the global advanced memory market for innovative materials that are highly defined for composition, size, purity and consistency.

While it can be difficult working with brittle magnetic alloys, Materion has the expertise to produce the widest range of high purity thin film materials to meet STT-RAM requirements.

Materion provides a wide variety of materials for large area thin film coating applications. Having the technical strength and manufacturing capability to develop, customize and produce sputtering targets across a variety of materials and alloys, Materion puts its resources to work for you to bring to market the next breakthrough in materials for large area coating.

Materion's produces precious metal & non-precous metal sputtering targets, ceramic & inorganic compound sputtering targets, evaporation materials and inorganic chemicals to enhance performance of solar devices.

Materion has developed a melt-based process for producing Aluminum-Scandium sputter targets with high chemical uniformity, low oxygen contents, and 3N purity.

Nickel Chromium sputtering targets for large area coating applications. Our NiCr targets are specifically developed to produce low defect and high performance thin films.

Niobium Oxide rotatable sputtering targets for glass and display applications. Our rotatable sputtering targets are specifically developed to produce low defect films for large area coating operations with optimized target lifetime.

Silicon Aluminum (SiAl) sputtering targets for large area coating applications. SiAl rotatable targets are produced by a fully controlled proprietary plasma spray process and are used in reflective and anti-reflective coating systems.

SIlver (Ag) sputtering targets for glass and photovoltaic applications. Our Ag rotatable sputtering targets are specifically developed to produce low defect films for large area coating operations with optimized target life time.

Tin (Sn) sputtering targets for large area coating applications. Our high purity Sn sputtering targets both planar and rotatable are specifically developed to produce low defect, high performance thin films.

Titanium Oxide rotatable sputtering targets for glass applications. Materion is the world’s leading supplier of rotatable sputtering targets for large area glass coatings.

Rotatable sputtering targets for high performance Al-doped Zn oxide coatings. Our thermally sprayed ZAO rotatables increase target utilization and save raw materials costs.

Sputtering targets for large area coating applications. Our high purity zinc/zinc alloy targets are specifically developed to produce low defect and high performance thin films.

Due to cost, mechanical strength and handling silver is not available in the rotating cylindrical form. However, new methods are being tested at Materion that will enable silver to be in the desired form.