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ENHANCE THIN FILM DEPOSITION WITH MATERION ME GRADETM TARGETS


Our magnetically enhanced sputtering targets optimize the Pass Through Flux (PTF) of ferromagnetic materials to substantially improve their sputtering performance. They counteract the problem presented by ferromagnetic materials where their magnetic flux shunts the cathode’s magnetic flux, thus resulting in unstable plasmas and non-uniform film deposition.

MAGNETICALLY ENHANCED SPUTTERING TARGETS ADVANTAGES

Materion’s proprietary ME GradeTM targets and fabrication processes control ferromagnetic materials’ crystal orientation and grain size. Our sputtering experts determine the best methods of optimizing the PTF based on your product and process. Benefits for users include:

  • Minimize magnetic shunting
  • Stabilize the plasma
  • Improve thin film uniformity
  • Increase thin film deposition rates and shorten cycle times
  • Verify the magnetic properties of all our ME GradeTM targets in accordance with ASTM Test Method F-1761

RELATED TARGET CONSUMABLES & SERVICES

As a totally integrated supplier, we also offer a full line of complementary sputtering consumables and services for the convenience of partnering with one company for all your thin film deposition needs.

Consult with a Materion engineer to discuss magnetically enhanced sputtering targets and how they can address your challenges with ferromagnetic materials.