Home Products Thin Film Deposition Materials Sputtering Targets VCT™ DECREASE GRAIN SIZE WITH VIBRATION CASTING TECHNOLOGY TARGETS Materion has developed a method to refine the grain structure of brittle metals without the risk of cracking or breaking. Typically, sputtering target grain structures are refined by a combination of metal working and heat treating techniques. However, many non-ductile alloys cannot withstand these types of metal working processes. To resolve this problem, we apply our proprietary VCT™ to the metal as it solidifies. This action decreases grain size by as much as 90%! VCT™ SPUTTERING TARGETS OFFER MULTIPLE ADVANTAGES Users that employ vibration casting technology overcome the challenge of refining grain structure of brittle metals without having to mechanically work on them. Decreased grain size enables users to: Stabilize sputtering process parameters Improve film uniformity Raise process yields Increase chamber utilization rates Reduce material failure RESOLVING RELATED GRAIN STRUCTURE ISSUES Materion addresses other technical issues when dealing with certain metals that our customers’ are experiencing. These technical issues include: Dealing with brittle alloys, such as AuSn or AuGe, which often exhibit large and varying grain sizes causing instability in the thin film deposition process Vibrational frequencies and amplitudes that must be carefully selected based on material type, target configuration and desired grain structure Challenges of sputtering during PVD processes…Read technical paper for more information RELATED TARGET CONSUMABLES & SERVICES In addition to our VCT™ sputtering targets, Materion offers a full line of sputtering products and services for the convenience of partnering with one company: backing plates, target bonding, precision parts cleaning, recycling & refining and precious metals management. Contact our staff of sputtering experts to discuss how vibration casting technology targets can resolve your brittle metal grain structure issues.